Ayub, Wan Nurhasana and Hasbullah, Nurul Fadzlin and Rashid, Abdul Aish Abdallah (2017) Electrical characterization of commercial power MOSFET under electron radiation. Indonesian Journal of Electrical Engineering and Computer Science, 8 (2). pp. 462-466. ISSN 2502-4752 E-ISSN 2502-4760
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Abstract
This paper presents the threshold voltage shifts for both p-channel and n-channel commercial power MOSFET before and after electron irradiation. The experiment was done under the 3MeV energy of electron with dose level varies from 50KGy until 250KGy. The results were plotted and analyzed in terms of the shifted voltage characteristics. It is observed that after irradiation, both p-channel and n-channel MOSFET experiences negative threshold voltage shifts. For n-channel devices, this is due to the radiationinduced positive charges dominated in the oxide traps while for p-channel devices it is believed due to radiation-induced ionization damage.
Item Type: | Article (Journal) |
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Additional Information: | 4527/62829 |
Uncontrolled Keywords: | commercial power mosfet, threshold voltage shifts, electron radiation |
Subjects: | T Technology > TK Electrical engineering. Electronics Nuclear engineering |
Kulliyyahs/Centres/Divisions/Institutes (Can select more than one option. Press CONTROL button): | Kulliyyah of Engineering Kulliyyah of Engineering > Department of Electrical and Computer Engineering |
Depositing User: | Dr Nurul Fadzlin Hasbullah |
Date Deposited: | 20 Mar 2018 11:10 |
Last Modified: | 11 Jul 2018 02:20 |
URI: | http://irep.iium.edu.my/id/eprint/62829 |
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