Surface roughness of FIB sputtered silicon

Ali, Mohammad Yeakub and Hung, N. P. and Yuan, S. (2001) Surface roughness of FIB sputtered silicon. In: Precision Engineering at the Beginning of a Millenium (ICPE), 18-20 July 2001, Yokohama, Japan.

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Abstract

Mathematical models are developed to calculate the surface roughness of focused-ion-beam (FIB) sputtered surface. The surface roughness is the combination of the beam function and the material function. The beam function includes ion type, acceleration voltage, ion flux, intensity distribution, dwell time, etc; the material function includes the inherent material properties related to FIB micromachining. Surface of FIB sputtered (100) silicon was characterized using atomic force microscope. Reasonable agreement between the calculated and measured surface roughness was found.

Item Type:	Conference or Workshop Item (Full Paper)
Additional Information:	4751/28903
Subjects:	T Technology > TJ Mechanical engineering and machinery T Technology > TS Manufactures
Kulliyyahs/Centres/Divisions/Institutes (Can select more than one option. Press CONTROL button):	Kulliyyah of Engineering > Department of Manufacturing and Materials Engineering
Depositing User:	Prof. Ir. Dr. Mohammad Yeakub Ali
Date Deposited:	05 Jun 2013 11:40
Last Modified:	25 Jun 2013 13:23
URI:	http://irep.iium.edu.my/id/eprint/28903

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