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Influence of surface energy and elastic strain energy on the graphene growth in chemical vapor deposition

Sirat, Mohd Shukri and Ismail, Edhuan and Ramlan, Amir Hakimi and Fauzi, Fatin Bazilah and Yaacob, Iskandar Idris and Mohamed, Mohd Ambri and Mohd Abid, Mohd Asyadi Azam and Ani, Mohd Hanafi (2019) Influence of surface energy and elastic strain energy on the graphene growth in chemical vapor deposition. In: Nanotech Malaysia 2018 in conjunction with 3rd International Conference on Enabling Science and Nanotechnology (ESciNano 2018), 5th Malaysia Workshop on 2D Materials and Carbon Nanotube (2DMC 2018), 7th-9th May 2018, Kuala Lumpur.

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Abstract

Polycrystalline metal substrates such as copper (Cu) have been intensively used to grow graphene in chemical vapor deposition (CVD) technique. It has been observed that crystal orientations affect the quality of graphene produced to some degree. The existence of crystal orientations caused graphene to grow randomly on top of Cu which also resulted on the formation of polycrystalline graphene. Despite this, the influence of crystal orientations on the quality of graphene produced are not yet fully understood. There are two possible factors that could affect graphene growth from crystal orientation point of view; surface energy and elastic strain energy. The understanding towards these both factors might beneficial to control the quality of graphene. This paper thus aims to highlight the influence of surface energy and elastic strain energy on the graphene growth in CVD. Substrate used were single crystal Cu with (111), (110) and (100) orientations. The graphene was grown inside a closed reaction chamber with the presence of argon (Ar), hydrogen (H2) and methane (CH4) gases with partial pressure ratio of 0.6: 0.2: 0.2 at 1 atm, 1000 ˚C in 30 minutes. The quality of the as-grown graphene was identified using Raman spectroscopy. The Raman spectra show the existence of graphene peak for all the Cu substrates. The calculation of ID/IG ratio revealed that the Cu (100) possessed the lowest amount of defects compared to Cu(110) and Cu(111). While I2D/IG ratio fluctuated between 0.22 to 0.34 suggested that the crystal orientation does not control the thickness of graphene layer at these reaction conditions. The usage of higher CH4 partial pressure produced a thicker graphene. It is assumed that the thickness of the graphene exceeded the critical thickness thus elastic strain energy becomes the dominant factor in controlling graphene growth. Larger lattice mismatch causes major defects on graphene and this result has been shown in graphene grown on top of Cu(111). These findings thus would give a new insight to tailor the high-quality large-area graphene growth in CVD.

Item Type: Conference or Workshop Item (Plenary Papers)
Additional Information: 4583/71184
Uncontrolled Keywords: Graphene CVD, Surface Energy, Elastic Strain Energy, Lattice Mismatch, Crystal Orientation
Subjects: T Technology > T Technology (General)
T Technology > TJ Mechanical engineering and machinery
Kulliyyahs/Centres/Divisions/Institutes (Can select more than one option. Press CONTROL button): Kulliyyah of Engineering
Kulliyyah of Engineering > Department of Manufacturing and Materials Engineering
Depositing User: Dr Mohd Hanafi Ani
Date Deposited: 21 Mar 2019 16:23
Last Modified: 15 Jul 2019 12:37
URI: http://irep.iium.edu.my/id/eprint/71184

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