Dependence of preferred c-axis orientation on RF magnetron sputtering power for AZO/Si acoustic wave devices

Md Ralib @ Md Raghib, Aliza 'Aini and Nordin, Anis Nurashikin and Abdul Malik, Noreha and Othman, Raihan (2015) Dependence of preferred c-axis orientation on RF magnetron sputtering power for AZO/Si acoustic wave devices. In: 2015 Symposium on Design, Integration, Test and Packaging of MEMS and MOEMS (DTIP), 27th-30th April 2015, Montpellier, France.

	PDF - Published Version Restricted to Repository staff only Download (800kB) | Request a copy
Preview	PDF Download (472kB) | Preview

Abstract

We report the deposition of high quality c-axis oriented Aluminium doped Zinc Oxide (AZO) on silicon substrate for surface acoustic wave (SAW) applications. AZO thin film is prepared by Radio frequency magnetron sputtering method. Sputtering is a preferred method because it is able to perform deposition at low temperature, produce uniform thin film and possesses high deposition rates. In preserving the functionality of the device during post CMOS process, low deposition temperature is crucial. In order to obtain the preferred AZO structural properties with strong acoustoelectric interaction, we investigate the influence of RF power on c-axis preferred orientation of AZO/Si multilayer. The deposited thin films are characterized by X-Ray diffractometer and scanning electron microscopy (SEM). The crystal structures are evaluated in terms of c-axis lattice constant, d-spacing and crystallite size. It is observed that as RF power increases, the AZO film is predominantly oriented at c-axis (002) and achieved high crystalline quality. However, if the applied RF power is too high, the energized ions would impede the growth of high quality film. The optimum RF power was found to be at 250 W, at which the material exhibits hexagonal wurtzite-type lattice of ZnO structure, high crystallinity (lowest FWHM value) and crystallite size, and high deposition rate.

Item Type:	Conference or Workshop Item (Invited Papers)
Additional Information:	3239/45282 (ISBN: 978-1-4799-8627-9, eISBN: 978-1-4799-8625-5, DOI: 10.1109/DTIP.2015.7160990)
Uncontrolled Keywords:	sputtering, Al doped ZnO, c-axis orientation, RF power, substrate heating
Subjects:	T Technology > TK Electrical engineering. Electronics Nuclear engineering > TK7800 Electronics. Computer engineering. Computer hardware. Photoelectronic devices
Kulliyyahs/Centres/Divisions/Institutes (Can select more than one option. Press CONTROL button):	Kulliyyah of Engineering > Department of Electrical and Computer Engineering Kulliyyah of Engineering > Department of Science
Depositing User:	Dr. Anis Nurashikin Nordin
Date Deposited:	26 Oct 2015 16:41
Last Modified:	21 Sep 2017 16:09
URI:	http://irep.iium.edu.my/id/eprint/45282

Actions (login required)

View Item