Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching

Za'bah, Nor Farahidah and Kwa, Kelvin S. K. and O'Neill, Anthony (2013) Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching. Advanced Materials Research, 629. pp. 115-121. ISSN 1022-6680

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Abstract

A top-down silicon nanowire fabrication using a combination of optical lithography and orientation dependent etching has been developed using Silicon-on Insulator (SOI) as the starting substrate. The design of experiments for the optimization of the process flow especially on the orientation dependent etching using potassium hydroxide (KOH) and Tetra-Methyl Ammonium Hydroxide (TMAH) are presented in this paper. Based on the etching experiments using silicon substrates, KOH with added isopropyl alcohol (IPA) had shown to have a consistent etch rate with acceptable silicon surface roughness as compared with its other counterparts. The concern regarding the effect of line edge roughness (LER) as a result of optical lithography was highlighted and, therefore, the optimization of the patterning procedure was also discussed and presented.

Item Type:	Article (Journal)
Additional Information:	5466/28245
Uncontrolled Keywords:	Silicon Nanowire; KOH; TMAH; LER
Subjects:	Q Science > QD Chemistry T Technology > TS Manufactures
Kulliyyahs/Centres/Divisions/Institutes (Can select more than one option. Press CONTROL button):	Kulliyyah of Engineering > Department of Electrical and Computer Engineering
Depositing User:	Dr. Nor Farahidah Za'bah
Date Deposited:	10 Jan 2013 13:37
Last Modified:	19 Feb 2013 13:12
URI:	http://irep.iium.edu.my/id/eprint/28378

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