Tursunov, Ikromjon Gulamovich and Okhunov, Abdurahim and Mamatkarimov, Odiljon Oxundadaevich (2018) About the silicon sensitivity of the deep level with alternating pressure. IIUM Engineering Journal, 19 (2). pp. 164-171. ISSN 1511-788X E-ISSN 2289-7860
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Official URL: http://journals.iium.edu.my/ejournal/index.php/iiu...
Abstract
This paper discusses the strain sensitivity of silicon with deep levels under variable pressure. It is shown that in the pressure swing in silicon with deep levels, there is a redistribution of the primary spatial inhomogeneities in the distribution of impurities so that the electron-hole relaxation after stress relief will occur in the new potential relief.
Item Type: | Article (Journal) |
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Additional Information: | 6825/67747 |
Uncontrolled Keywords: | semiconductors; properties; dynamic and deep levels |
Subjects: | Q Science > QC Physics |
Kulliyyahs/Centres/Divisions/Institutes (Can select more than one option. Press CONTROL button): | Kulliyyah of Engineering Kulliyyah of Engineering > Department of Science |
Depositing User: | Dr. Abdurahim Okhunov |
Date Deposited: | 04 Dec 2018 10:52 |
Last Modified: | 27 Jan 2019 15:40 |
URI: | http://irep.iium.edu.my/id/eprint/67747 |
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