Dilute electrodeposition of TiO2 and ZnO thin film memristors on Cu substrate

Fauzi, Fatin Bazilah and Ani, Mohd Hanafi and Herman, Sukreen Hana and Mohamed, Mohd Ambri (2018) Dilute electrodeposition of TiO2 and ZnO thin film memristors on Cu substrate. In: 6th International Conference on Electronic Devices, Systems and Applications 2017 (ICEDSA 2017), 8-9 August 2017, Kuching, Sarawak, Malaysia.

	PDF (IOP conference series) - Published Version Restricted to Registered users only Download (1MB) | Request a copy
Preview	PDF Download (471kB) | Preview

Abstract

Memristor has become one of the alternatives to replace the current memory technologies. Fabrication of titanium dioxide, TiO2 memristor has been extensively studied by using various deposition methods. However, recently more researches have been done to explore the compatibility of other transition metal oxide, TMO such as zinc oxide, ZnO to be used as the active layer of the memristor. This paper highlights the simple and easy-control electrodeposition to deposit titanium, Ti and zinc, Zn thin film at room temperature and subsequent thermal oxidation at 600 oC. Gold, Au was then sputtered as top electrode to create metal-insulator-metal, MIM sandwich of Au/TiO2-Cu2O-CuO/Cu and Au/ZnO-Cu2O-CuO/Cu memristors. The structural, morphological and memristive properties were characterized using Field Emission Scanning Electron Microscopy, FESEM, X-Ray Diffraction, XRD and current-voltage, I-V measurement. Both Au/TiO2-Cu2O-CuO/Cu and Au/ZnO-Cu2O-CuO/Cu memristivity were identified by the pinched hysteresis loop with resistive ratio of 1.2 and 1.08 respectively. Empirical study on diffusivity of Ti4+, Zn2+ and O2- ions in both metal oxides show that the metal vacancies were formed, thus giving rise to its memristivity. The electrodeposited Au/TiO2-Cu2OCuO/Cu and Au/ZnO-Cu2O-CuO/Cu memristors demonstrate comparable performances to previous studies using other methods.

Item Type:	Conference or Workshop Item (Plenary Papers)
Additional Information:	4583/63444
Uncontrolled Keywords:	Dilute electrodeposition; TiO2; ZnO; Thin film memristors; Cu substrate
Subjects:	T Technology > T Technology (General) T Technology > TA Engineering (General). Civil engineering (General) > TA401 Materials of engineering and construction
Kulliyyahs/Centres/Divisions/Institutes (Can select more than one option. Press CONTROL button):	Kulliyyah of Engineering > Department of Manufacturing and Materials Engineering
Depositing User:	Dr Mohd Hanafi Ani
Date Deposited:	26 Apr 2018 15:26
Last Modified:	26 Jun 2018 16:03
URI:	http://irep.iium.edu.my/id/eprint/63444

Actions (login required)

View Item