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Sputtering of paraboloid microstructure using fib

Ali, Mohammad Yeakub and Loo, Y. W. (2006) Sputtering of paraboloid microstructure using fib. In: International Conference on MEMS and Nanotechnology (ICMN'06), 15-16 March 2006 , Kuala Lumpur, Malaysia.

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This paper describes the fabrication of three dimensional (3D) microstructures using focused ion beam (FIB) sputtering. Paraboloid cavity was chosen as an example for 3D microstructure. This microstructure was considered as the combination of a series of flat circular slices. The successive slices were 1 μm smaller in diameter compared to the previous layers. The diameters of the biggest and smallest slice were 16 μm and 1 μm respectively. The thickness of each slice was about 0.2 μm. An appropriate amount of ion dose was delivered to sputter the particular thickness for each slice. The slice by slice sputtering command was given by the Micrion DMOD description language (MDDL). Geometry and surface characteristics of microparaboloid structures were investigated by using scanning electron microscope (SEM) and atomic force microscope (AFM). The diameter at the top and depth of the sputtered paraboroid were found to be 16 μm and 3.2 μm respectively.

Item Type: Conference or Workshop Item (Full Paper)
Additional Information: 4751/27177
Subjects: T Technology > TJ Mechanical engineering and machinery
T Technology > TS Manufactures
Kulliyyahs/Centres/Divisions/Institutes (Can select more than one option. Press CONTROL button): Kulliyyah of Engineering > Department of Manufacturing and Materials Engineering
Depositing User: Prof. Ir. Dr. Mohammad Yeakub Ali
Date Deposited: 04 Sep 2013 12:27
Last Modified: 04 Sep 2013 12:27
URI: http://irep.iium.edu.my/id/eprint/27177

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