Optimization of zinc oxide thin films for silicon surface acoustic wave resonator applications

Sidek, Fatini and Nordin, Anis Nurashikin and Othman, Raihan (2012) Optimization of zinc oxide thin films for silicon surface acoustic wave resonator applications. Advanced Materials Research, 518-23. pp. 3772-3779. ISSN 1022-6680

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Abstract

High quality ZnO thin films are required to produce CMOS SAW resonators operating with low losses and high Q. This work intends to develop high performance CMOS SAW resonators through optimization of both the quality of the ZnO and the design of the SAW resonator. Zinc oxide was chosen for this work as the piezoelectric material due to its superior acoustic propagation properties and compatibility with integrated circuit fabrication techniques. ZnO has demonstrated good performance characteristics for a variety of piezoelectric devices. For optimization of the quality of the deposited ZnO thin film, different RF-sputtering conditions will be used to investigate which condition produces the best piezoelectric quality of the ZnO thin film. The experiments were carried using Taguchi optimization method, which studies a large number of variables with a small number of experiments.

Item Type:	Article (Journal)
Additional Information:	3239/26716
Uncontrolled Keywords:	Zinc oxide; surface acoustic wave resonator
Subjects:	T Technology > TK Electrical engineering. Electronics Nuclear engineering > TK7800 Electronics. Computer engineering. Computer hardware. Photoelectronic devices > TK7885 Computer engineering
Kulliyyahs/Centres/Divisions/Institutes (Can select more than one option. Press CONTROL button):	Kulliyyah of Engineering
Depositing User:	Dr. Anis Nurashikin Nordin
Date Deposited:	04 Dec 2012 07:43
Last Modified:	23 Jul 2013 14:38
URI:	http://irep.iium.edu.my/id/eprint/26716

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