Fabrication of Silicon Nanopillar Sheet for Cell Culture Dish

Ali, Mohammad Yeakub and Mohd Fuad, Nurul Hajar (2010) Fabrication of Silicon Nanopillar Sheet for Cell Culture Dish. In: UNSPECIFIED.

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Abstract

This paper discusses the fabrication of nanopillars using focused ion beam (FIB) sputtering. A 25 keV Ga+ FIB was used to machine the nanopillars. A reversed bitmap method was used to fabricate nanopillars where it milled the substrate all over except the nanopillar area. The height of the nanopillars ranges from 1 to 5.5 μm with aspect ratio of 1-6. Empirical relationship of taper angle, aspect ratio and height of the nanopillar were established. Taper angle was found to be reduced as the height of the nanopillar increased. The taper angle of nanopillars depends on the acceleration voltage, probe current and dwell time.

Item Type:	Conference or Workshop Item (UNSPECIFIED)
Additional Information:	/2505
Uncontrolled Keywords:	Focused ion beam (FIB), nanopillar, nanopillar sheet
Subjects:	T Technology > TJ Mechanical engineering and machinery T Technology > TS Manufactures
Kulliyyahs/Centres/Divisions/Institutes (Can select more than one option. Press CONTROL button):	Kulliyyah of Engineering > Department of Manufacturing and Materials Engineering
Depositing User:	Prof. Ir. Dr. Mohammad Yeakub Ali
Date Deposited:	14 Sep 2011 16:36
Last Modified:	31 Jan 2012 15:51
URI:	http://irep.iium.edu.my/id/eprint/2505

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