Novel nanofabrication process of oxide patterns using AFM in low operating temperature: a promising lithographic tool for future molecular electronics

Sutjipto, Agus Geter Edy and -, Afzeri and Muhida, Riza and Mridha, Shahjahan (2007) Novel nanofabrication process of oxide patterns using AFM in low operating temperature: a promising lithographic tool for future molecular electronics. In: International Conference on Electrical Engineering and Informatics Institut Teknologi , 17-19 June 2007, Bandung, Indonesia .

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Abstract

Field-induced oxidation has become a promising process that is capable of directly producing high-resolution surface oxide patterns on variety materials. In this report, a low temperature operation of an atomic force microscope (AFM) was used to condense ambient humidity to perform a thin frozen water layer covering a silicon wafer surface. A scanning probe was contacted with the layer and a zero bias voltage was applied to the probe tip. The frozen water film acted both as an electrolyte for forming the oxides and as a resource of hydroxide. Using this technique, a consistency in height of about 6 nm silicon dioxide patterns layer could be achieved.

Item Type:	Conference or Workshop Item (Full Paper)
Additional Information:	4703/9447
Subjects:	T Technology > TK Electrical engineering. Electronics Nuclear engineering > TK452 Electric apparatus and materials. Electric circuits. Electric networks
Kulliyyahs/Centres/Divisions/Institutes (Can select more than one option. Press CONTROL button):	Kulliyyah of Engineering
Depositing User:	Dr Agus Geter Edy Sutjipto
Date Deposited:	06 Apr 2012 15:22
Last Modified:	06 Apr 2012 15:22
URI:	http://irep.iium.edu.my/id/eprint/9447

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