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Design and fabrication stable LNF contact for future IC application

Bhuiyan, Moinul and Rashid, Muhammad Mahbubur and Ahmed, Sayem and Bhuiyan, Munira and Kajihara, Masanori (2013) Design and fabrication stable LNF contact for future IC application. IOP Conference Series: Materials Science and Engineering, 53 (012060). ISSN 1757-8981

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Enable the design of a small contact spring for applications requiring high density, high speed and high durability. A low normal force (LNF) contact spring with high performance is fabricated using a unique combined MEMS photo resist lithography and electro fine forming (EFF) technology. Reducing a total contact material cost of a connector, a high-Hertz stress with LNF contact will be a key technology in the future. Only radius R 5m tip with 0.1N force contact provides an excellent electrical performance which is much sharper than conventional contact. 0.30million cycle’s durability test was passed at 300m displacement and the contact resistance was ≦50mΩ.

Item Type: Article (Journal)
Additional Information: 5486/34439
Uncontrolled Keywords: LNF contact, high-Hertz stress, electro fine forming, NiCo, photolithography
Subjects: T Technology > TA Engineering (General). Civil engineering (General) > TA174 Engineering design
Kulliyyahs/Centres/Divisions/Institutes (Can select more than one option. Press CONTROL button): Kulliyyah of Engineering
Depositing User: Dr. Moinul Bhuiyan
Date Deposited: 16 Jan 2014 16:30
Last Modified: 03 Jul 2014 15:35
URI: http://irep.iium.edu.my/id/eprint/34439

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