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A low normal force contact using photolithography and Ni-Co electro fine forming technology

Bhuiyan , Moinul and Takemasa, Eiichiro (2009) A low normal force contact using photolithography and Ni-Co electro fine forming technology. In: TE-Japan Technical Conference, 14 May 2009, Kawasaki, Japan.

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Abstract

This new technology is realized by Photo Resist Lithography and Ni-Co Electro Fine Forming technology, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0.15N at 0.3mm) at contact point (5μm radius), durability of 100,000 contact cycles (less than 50m�). The particle size of the Ni-Co crystal must be less than 100nm as measured by STEM.

Item Type: Conference or Workshop Item (Full Paper)
Additional Information: 6801/33437
Subjects: T Technology > TA Engineering (General). Civil engineering (General) > TA165 Engineering instruments, meters, etc. Industrial instrumentation
Kulliyyahs/Centres/Divisions/Institutes (Can select more than one option. Press CONTROL button): Kulliyyah of Engineering
Depositing User: Dr. Moinul Bhuiyan
Date Deposited: 18 Dec 2013 12:45
Last Modified: 18 Dec 2013 12:45
URI: http://irep.iium.edu.my/id/eprint/33437

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