Development of low normal force contact using electro fine forming and lithography technology

Bhuiyan, Moinul and Yamada, Shinji and Kurokawa, Noriharu and Sakamoto, Katsuhiko and Takemasa, Eiichiro (2008) Development of low normal force contact using electro fine forming and lithography technology. In: Tyco Electronics Technical Conference 2008, 14-16 Oct 2008, Shanghai, China. (Unpublished)

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Abstract

This new technology is realized by Photo Resist Lithography and NiCo Electro Fine Forming Process, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0.15N at 0.3mm) at contact point (5μm radius), durability of 100,000 contact cycles (less than 50mΩ).

Item Type:	Proceeding Paper (Full Paper)
Additional Information:	6801/33190
Subjects:	T Technology > TA Engineering (General). Civil engineering (General) > TA401 Materials of engineering and construction
Kulliyyahs/Centres/Divisions/Institutes (Can select more than one option. Press CONTROL button):	Kulliyyah of Engineering
Depositing User:	Dr. Moinul Bhuiyan
Date Deposited:	20 Dec 2013 15:34
Last Modified:	20 Dec 2013 15:34
URI:	http://irep.iium.edu.my/id/eprint/33190

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